Amorphous In–Ga–Zn–O coplanar homojunction thin-film transistor

Ayumu Sato, Katsumi Abe, Ryo Hayashi, +5

Applied Physics Letters

Materials ScienceSemiconductor TechnologyElectrical EngineeringElectronic DevicesEngineering +11

Materials, Devices, and Circuits of Transparent Amorphous-Oxide Semiconductor

Hideya Kumomi, Seiichiro Yaginuma, Hideyuki Omura, +17

Journal of Display Technology

Optical MaterialsEngineeringSemiconductor MaterialsSemiconductorsNanoelectronics +14

Amorphous In–Ga–Zn-O thin-film transistor with coplanar homojunction structure

Ayumu Sato, Mikio Shimada, Katsumi Abe, +6

Thin Solid Films

Materials ScienceCoplanar Homojunction StructureEngineeringElectronic MaterialsApplied Physics +3

42.1: <i>Invited Paper</i> : Improved Amorphous In‐Ga‐Zn‐O TFTs

Ryo Hayashi, Ayumu Sato, Masato Ofuji, +8

SID Symposium Digest of Technical Papers

High‐mobility self‐aligned top‐gate oxide TFT for high‐resolution AM‐OLED

Narihiro Morosawa, Masanori Nishiyama, Yoshihiro Ohshima, +9

Journal of the Society for Information Display

Materials ScienceWhite OledElectrical EngineeringElectronic DevicesHigh‐resolution Am‐oled +13

Mobility- and temperature-dependent device model for amorphous In–Ga–Zn–O thin-film transistors

Katsumi Abe, Ayumu Sato, Kenji Takahashi, +3

Thin Solid Films

Materials ScienceSemiconductor TechnologyElectrical EngineeringEngineeringApplied Physics +6

10.1: High Mobility Self‐Aligned Top‐Gate Oxide TFT for High‐Resolution AM‐OLED

Narihiro Morosawa, Masanori Nishiyama, Yoshihiro Ohshima, +9

SID Symposium Digest of Technical Papers

41.2: Micro Silicon Technology for Active Matrix OLED Display

Toshiaki Arai, Narihiro Morosawa, Yasunobu Hiromasu, +11

SID Symposium Digest of Technical Papers

Micro Silicon TechnologyElectrical EngineeringEngineeringDisplay TechnologyMicrofabrication +9

Characterization of AlN:Mn thin film phosphors prepared by metalorganic chemical vapor deposition

Ayumu Sato, K. Azumada, T. Atsumori, +1

Journal of Crystal Growth

Materials ScienceAluminium NitrideChemical EngineeringEngineeringNanotechnology +5

Operation model with carrier-density dependent mobility for amorphous In–Ga–Zn–O thin-film transistors

Katsumi Abe, Kenji Takahashi, Ayumu Sato, +4

Thin Solid Films

Materials ScienceSemiconductor TechnologyElectrical EngineeringOperation ModelEngineering +6