Concepedia

Nobutake Konishi

NK

Statistics

Publications

6

Citations

111

H-Index

6

Active since

1987

Affiliations

Hitachi (Japan)(Current)

Nobutake Konishi is an author at Hitachi (Japan) specializing in materials science, silicon materials, and thin films.

Publications per year

1987–1995

6

Publications

6

Hydrogenation kinetics and defect termination of post-plasma-treated chemical-vapor-deposited amorphous silicon film

Minoru Nakamura, Toshiyuki Ohno, Kenji Miyata et al. · Journal of Applied Physics · 1989 · 31 citations

Natural Sciences, Materials Engineering, Materials Science +17

Indium Tin Oxide Dry Etching Using HBr Gas for Thin‐Film Transistor Liquid Crystal Displays

Masaru Takabatake, Y. Wakui, Nobutake Konishi · Journal of The Electrochemical Society · 1995 · 29 citations

Engineering, Materials Engineering, Materials Science +17

Application of Ion Doping and Excimer Laser Annealing to Fabrication of Low-Temperature Polycrystalline Si Thin-Film Transistors

Genshiro Kawachi, Takashi Aoyama, Akio Mimura et al. · Japanese Journal of Applied Physics · 1994 · 16 citations

Engineering, Electrical Engineering, Materials Science +17

Large-Area Doping Process for Fabrication of poly-Si Thin Film Transistors Using Bucket Ion Source and XeCl Excimer Laser Annealing

Genshiro Kawachi, Takashi Aoyama, Takaya Suzuki et al. · Japanese Journal of Applied Physics · 1990 · 15 citations

Engineering, Electrical Engineering, Materials Science +17

TEM Observations of Initial Crystallization States for LPCVD Si Films

Eimi Adachi, Takashi Aoyama, Nobutake Konishi et al. · Japanese Journal of Applied Physics · 1988 · 10 citations

Natural Sciences, Materials Engineering, Materials Science +17

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