Tohru Ishitani - Concepedia

Author

Tohru Ishitani

Hitachi (Japan)

Also Known As

T Ishitani, T. Ishitani, TOHRU ISHITANI, Tohru ISHITANI, Tohru Ishitani, Tohru Ishitani Tohru Ishitani, Tohru. Ishitani

Publications

994

Citations

H-Index

Concepts

All Affiliations

Hitachi (Japan)The University of Osaka Tokushima University

About

Tohru Ishitani is an author at Hitachi (Japan) specializing in engineering, applied physics, and instrumentation.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	16	28	696
2	Applied Physics	14	20	533
3	Medicine	5	5	104
4	Natural Sciences	2	2	21
5	Health Sciences	1	1	34

Tohru Ishitani

Publications

696

Citations

H-Index

Page 1

	Year	Citations
Monte Carlo Simulations on Scattering of Bombarded Ions in Solids Tohru Ishitani, Ryuichi Shimizu, Kenji Murata Japanese Journal of Applied Physics Elastic ScatteringEngineeringPhysicsOptical PropertiesMonte Carlo	1972	84
Calculation of Local Temperature Rise in Focused-Ion-Beam Sample Preparation Tohru Ishitani, Hiroyasu Kaga Journal of Electron Microscopy Optical MaterialsEngineeringLaser ApplicationsIon Beam InstrumentationLocal Temperature Rise	1995	62
Micromachining and Device Transplantation Using Focused Ion Beam Tohru Ishitani, Tsuyoshi Ohnishi, Yoshimi Kawanami Japanese Journal of Applied Physics Electrical EngineeringIon ImplantationDevice Transplantation UsingFib MicromachiningEngineering	1990	36
Monte Carlo study of secondary electron emission from SiO2 induced by focused gallium ion beams K. Ohya, Tohru Ishitani Applied Surface Science Ion ImplantationEngineeringPhysicsMonte-carlo ModellingSecondary Electron Emission	2004	35
Objective comparison of scanning ion and scanning electron microscope images Tohru Ishitani, Hideki Tsuboi Scanning EngineeringMicroscopyIon Beam InstrumentationElectron BeamsSim Images	1997	34
Electrical Properties of Focused-Ion-Beam Boron-Implanted Silicon M. Tamura, S. Shukuri, S. Tachi, Japanese Journal of Applied Physics Materials ScienceBeam DiameterElectrical EngineeringIon ImplantationEngineering	1983	34
Fundamental Studies on Quantitative Analysis in Ion Probe Microanalyzer Ryuichi Shimizu, Tohru Ishitani, Yasumasa Ueshima Japanese Journal of Applied Physics Electron DensityEngineeringAnalytical InstrumentationMeasurementMicroscopy	1974	32
Practicality of the thermodynamic model for quantitative ion probe microanalysis of low alloy steels Ryuichi Shimizu, Tohru Ishitani, Toshio Kondo, Analytical Chemistry Materials ScienceEngineeringLow Alloy SteelsAnalytical InstrumentationThermodynamic Model	1975	32
Method for Cross-sectional Transmission Electron Microscopy Specimen Preparation of Composite Materials Using a Dedicated Focused Ion Beam System Toshie Yaguchi, Takeo Kamino, Tohru Ishitani, Microscopy and Microanalysis Ga Implantation RateEngineeringMicroscopyIon Beam InstrumentationIon Implantation	1999	32
Modeling of sputtering and redeposition in focused-ion-beam trench milling Tohru Ishitani, Tsuyoshi Ohnishi Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Ion ImplantationEngineeringPhysicsSteady State ApproximationFib Trench	1991	30

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