K. Horita

Ultra-shallow junction formation by B18H22 ion implantation

Yoji Kawasaki, T. Kuroi, Takashi Yamashita et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 2005 · 41 citations

Ion Implantation, Ultra-shallow Junction Formation, Applied Physics +1

Stress analysis of shallow trench isolation for 256 M DRAM and beyond

T. Kuroi, Tetsuya Uchida, K. Horita et al. · 2002 · 18 citations

Engineering, Mechanical Engineering, Residual Stress +18

Novel Shallow Trench Isolation Process from Viewpoint of Total Strain Process Design for 45 nm Node Devices and Beyond

Masato Ishibashi, K. Horita, Mahito Sawada et al. · Japanese Journal of Applied Physics · 2005 · 12 citations

Materials Science, Electrical Engineering, Gate Oxidation +12

Quantitative investigation of localized ion irradiation effects in <i>n</i>-channel metal-oxide-semiconductor field-effect transistors using single ion microprobe

M. Koh, K. Horita, B. Shigeta et al. · Applied Physics Letters · 1996 · 11 citations

Localized Ion Irradiation, Semiconductor Technology, Electrical Engineering +15

Advanced shallow trench isolation to suppress the inverse narrow channel effects for 0.24 μm pitch isolation and beyond

K. Horita, T. Kuroi, Yokichi Itoh et al. · 2002 · 10 citations