Concepedia

Tatsuya Ishida

TI

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Publications

2

Citations

29

H-Index

2

Active since

2007

Affiliations

Toshiba (Japan)(Current)

Tatsuya Ishida is an author at Toshiba (Japan) specializing in engineering, electrical engineering, and microelectronics.

Top concepts

Publications per year

2007–2008

2

Publications

2

In situ Doped Embedded-SiGe Source/Drain Technique for 32 nm Node p-Channel Metal–Oxide–Semiconductor Field-Effect Transistor

H. Okamoto, A. Hokazono, K. Adachi et al. · Japanese Journal of Applied Physics · 2008 · 16 citations

A high performance pMOSFET with two-step recessed SiGe-S/D structure for 32nm node and beyond

Nobuaki Yasutake, A. Azuma, Tatsuya Ishida et al. · Solid-State Electronics · 2007 · 13 citations

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