Jerry Z. Y. Guo - Concepedia

Author

Jerry Z. Y. Guo

University of Wisconsin–Madison

Also Known As

J Guo, J. Z. Y. Guo, J.Z.Y. Guo, Jerry Guo, Jerry Z. Guo, Jerry Z. Y. Guo

Publications

274

Citations

H-Index

Concepts

All Affiliations

University of Wisconsin–Madison

About

Jerry Z. Y. Guo is an author at University of Wisconsin–Madison specializing in engineering, applied physics, and x-ray imaging.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	8	8	225
2	Applied Physics	6	6	179
3	Health Sciences	4	4	85
4	Chemistry	1	1	29
5	Computer Engineering	1	1	21

Jerry Z. Y. Guo

Publications

225

Citations

H-Index

Page 1

	Year	Citations
Thermal stability analysis of UV-induced fiber Bragg gratings S. Kannan, Jerry Z. Y. Guo, P. J. Lemaire Journal of Lightwave Technology Transient GratingPhotonicsShort Wavelength OpticEngineeringSmall Index Changes	1997	96
Photoemission spectromicroscopy with MAXIMUM at Wisconsin W. Ng, Avijit K. Ray-Chaudhuri, R.K. Cole, Physica Scripta EngineeringChemistrySpectrochemical AnalysisSynchrotron Radiation SourceSynchrotron Radiation Research	1990	29
Nanometer-scale dimensional metrology for advanced lithography Herschel M. Marchman, J. E. Griffith, Jerry Z. Y. Guo, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyMicroscopyPolycapillary OpticsDimensional Metrology	1994	23
Modeling X-ray proximity lithography Jerry Z. Y. Guo, F. Cerrina IBM Journal of Research and Development EngineeringElectron-beam LithographyAdvanced Semiconductor CircuitsSystem-level DesignSimulation	1993	21
Aerial image formation in synchrotron-radiation-based x-ray lithography: The whole picture Jerry Z. Y. Guo, G. Chen, Victor White, Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena EngineeringMicroscopyPolycapillary OpticsSynchrotron Radiation SourceX-ray Imaging	1990	17
Experimental and theoretical study of image bias in x-ray lithography Jerry Z. Y. Guo, Q. Leonard, F. Cerrina, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyMicroscopyImage BiasNear Field	1992	16
Extendibility of x-ray lithography to ⩽130 nm ground rules in complex integrated circuit patterns Scott D. Hector, William Chu, M. C. Thompson, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyNm Ground RulesMicroscopyPattern Transfer	1996	13
Verification of partially coherent light diffraction models in x-ray lithography Jerry Z. Y. Guo, F. Cerrina Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Optical MaterialsEngineeringElectron-beam LithographyOptic DesignX-ray Imaging	1991	10

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