Woei-Cherng Wu

Reliability Mechanisms of LTPS-TFT With $\hbox{HfO}_{2}$ Gate Dielectric: PBTI, NBTI, and Hot-Carrier Stress

Ming-Wen Ma, Chih‐Yang Chen, Woei-Cherng Wu et al. · IEEE Transactions on Electron Devices · 2008 · 54 citations

Materials Science, Electrical Engineering, Hot-carrier Stress +13

Impact of High-$\kappa$ Offset Spacer in 65-nm Node SOI Devices

Ming-Wen Ma, Chien‐Hung Wu, Tsung‐Yu Yang et al. · IEEE Electron Device Letters · 2007 · 27 citations

Sub Xmlns, Engineering, Vlsi Design +16

Characteristics of $\hbox{HfO}_{2}$ /Poly-Si Interfacial Layer on CMOS LTPS-TFTs With $\hbox{HfO}_{2}$ Gate Dielectric and $\hbox{O}_{2}$ Plasma Surface Treatment

Ming-Wen Ma, Tsung‐Yu Chiang, Woei-Cherng Wu et al. · IEEE Transactions on Electron Devices · 2008 · 21 citations

Engineering, Optoelectronic Devices, Gate Dielectric +17

Positive Bias Temperature Instability (PBTI) Characteristics of Contact-Etch-Stop-Layer-Induced Local-Tensile-Strained $\hbox{HfO}_{2}$ nMOSFET

Woei-Cherng Wu, Tien‐Sheng Chao, Te-Hsin Chiu et al. · IEEE Electron Device Letters · 2008 · 19 citations

Semiconductor Technology, Electrical Engineering, Engineering +9

Fluorinated HfO<inf>2</inf> gate dielectrics engineering for CMOS by pre- and post-CF<inf>4</inf> plasma passivation

Woei-Cherng Wu, Chao‐Sung Lai, Shih-Ching Lee et al. · 2008 · 17 citations

Device Modeling, Semiconductor Technology, Electrical Engineering +13