Jongho Woo

Comprehensive Design Guidelines of Gate Stack for QLC and Highly Reliable Ferroelectric VNAND

Suhwan Lim, Taeyoung Kim, Ilho Myeong et al. · 2023 · 54 citations

Engineering, Computer Engineering, Electrical Engineering +17

In-depth Analysis of the Hafnia Ferroelectrics as a Key Enabler for Low Voltage & QLC 3D VNAND Beyond 1K Layers: Experimental Demonstration and Modeling

Giuk Kim, Hyojun Choi, Hunbeom Shin et al. · 2024 · 25 citations

Engineering, Electrical Engineering, Materials Science +17

Material Choices for Tunnel Dielectric Layer and Gate Blocking Layer for Ferroelectric NAND Applications

Lance Fernandes, Prasanna Venkatesan Ravindran, Taeyoung Song et al. · IEEE Electron Device Letters · 2024 · 21 citations

Natural Sciences, Electrical Engineering, Materials Science +14

Clarifying the Role of Ferroelectric in Expanding the Memory Window of Ferroelectric FETs with Gate-Side Injection: Isolating Contributions from Polarization and Charge Trapping

Yixin Qin, Saikat Chakraborty, Zijian Zhao et al. · 2024 · 14 citations

Engineering, Electrical Engineering, Materials Science +17

Optimizing Memory Window for Ferroelectric Nand Applications: An Experimental Study on Dielectric Material Selection and Layer Positioning

Lance Fernandes, Prasanna Venkatesan Ravindran, Mengkun Tian et al. · IEEE Transactions on Electron Devices · 2024 · 13 citations

Engineering, Electrical Engineering, Materials Science +15