M. Kubo

Characteristics and limitation of scaled-down MOSFET's due to two-dimensional field effect

H. Masuda, M. Nakai, M. Kubo · IEEE Transactions on Electron Devices · 1979 · 90 citations

Device Modeling, Low-power Electronics, Electrical Engineering +15

Perspective on BiCMOS VLSIs

M. Kubo, I. Masuda, Kenji Miyata et al. · IEEE Journal of Solid-State Circuits · 1988 · 68 citations

Electrical Engineering, Engineering, High-speed Electronics +14

Cu-ion-migration phenomena and its influence on TDDB lifetime in Cu metallization

J. Noguchi, Natsuko Miura, M. Kubo et al. · 2003 · 39 citations

Engineering, Advanced Packaging (Semiconductors), Corrosion +19

Impact of low-k dielectrics and barrier metals on TDDB lifetime of Cu interconnects

J. Noguchi, T. Saito, N. Ohashi et al. · 2002 · 36 citations

Engineering, Barrier Metal, Interconnect (Integrated Circuits) +17

Process and Reliability of Air-Gap Cu Interconnect Using 90-nm Node Technology

J. Noguchi, K. Sato, N. Konishi et al. · IEEE Transactions on Electron Devices · 2005 · 35 citations

Materials Engineering, Materials Science, Electrical Engineering +15