Concepedia

Takahisa Kanemura

TK

Statistics

Publications

2

Citations

26

H-Index

2

Active since

1994

Affiliations

Toshiba (Japan)(Current)

Takahisa Kanemura is an author at Toshiba (Japan) specializing in physics, nanoelectronics, and applied physics.

Top concepts

PhysicsEngineeringApplied PhysicsNanoelectronicsMicroelectronicsDevice ModelingSurface ScienceMaterial ScienceCrystalline DefectsElectrical Engineering

Publications per year

1994–2011

2

Publications

2

Anomalous diffusion of lightly implanted As into Si substrate during N2 annealing

Nobutoshi Aoki, Takahisa Kanemura, Ichiro Mizushima · Applied Physics Letters · 1994 · 13 citations

Materials Science, Si Substrate, Engineering +14

Advantage of Plasma Doping for Source/Drain Extension in Bulk Fin Field Effect Transistor

T. Izumida, Kimitoshi Okano, Takahisa Kanemura et al. · Japanese Journal of Applied Physics · 2011 · 13 citations

Device Modeling, Electrical Engineering, Ion Implantation +12

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