Kostas Adam

Lithography simulation for the fabrication of silicon photonic devices with deep-ultraviolet lithography

Xu Wang, Wei Shi, Michael Hochberg et al. · 2012 · 36 citations

Photonics, Engineering, Nanolithography Method +12

Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations

David Melville, Alan E. Rosenbluth, Kehan Tian et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 22 citations

Engineering, Electron-beam Lithography, Optic Design +16

Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems

David Melville, Alan E. Rosenbluth, Andreas Wäechter et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2011 · 19 citations

Computational Lithography, Engineering, Electron-beam Lithography +18

Accurate 3DEMF mask model for full-chip simulation

Michael Lam, Kostas Adam, David S. Fryer et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 19 citations

Mask 3Demf, Engineering, Computer Architecture +16

OPC modeling and correction solutions for EUV lithography

James Word, Christian Zuniga, Michael Lam et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 13 citations

Optical Materials, Engineering, Non-zero Reflectivity +18