Concepedia
Statistics
Publications
7
Citations
845
H-Index
Active since
1988
Affiliations
University of Tsukuba(Current)
The University of Tokyo
RIKEN
Jia-Fa Fan is an author at University of Tsukuba specializing in applied physics, engineering, and materials science.
Top concepts
EngineeringApplied PhysicsSemiconductorsMaterial ScienceSurface SciencePhysicsElectrical EngineeringQuantum MaterialsChemical EngineeringMaterials Engineering
Publications per year
1988–1992
Universal Passivation Effect of (NH<sub>4</sub>)<sub>2</sub>S<sub>x</sub> Treatment on the Surface of III-V Compound Semiconductors
Haruhiro Oigawa, Jia-Fa Fan, Yasuo Nannichi et al. · Japanese Journal of Applied Physics · 1991 · 244 citations
Engineering, Semiconductor Device, Semiconductors +16
A Model to Explain the Effective Passivation of the GaAs Surface by (NH<sub>4</sub>)<sub>2</sub>S<sub>x</sub> Treatment
Yasuo Nannichi, Jia-Fa Fan, Haruhiro Oigawa et al. · Japanese Journal of Applied Physics · 1988 · 186 citations
Semiconductors, Nh 4, Chemical Engineering +13
Metal-Dependent Schottky Barrier Height with the (NH<sub>4</sub>)<sub>2</sub>S<sub>x</sub>-Treated GaAs
Jia-Fa Fan, Haruhiro Oigawa, Yasuo Nannichi · Japanese Journal of Applied Physics · 1988 · 147 citations
Semiconductors, Nh 4, Electrical Engineering +10
Studies on an (NH<sub>4</sub>)<sub>2</sub>S<sub>x</sub>-Treated GaAs Surface Using AES, LEELS and RHEED
Haruhiro Oigawa, Jia-Fa Fan, Yasuo Nannichi et al. · Japanese Journal of Applied Physics · 1989 · 107 citations
Semiconductors, Materials Science, Nh 4 +12
Low-Temperature Growth of Thin Films of Al<sub>2</sub>O<sub>3</sub> by Sequential Surface Chemical Reaction of trimethylaluminum and H<sub>2</sub>O<sub>2</sub>
Jia-Fa Fan, Koji Sugioka, K. Toyoda · Japanese Journal of Applied Physics · 1991 · 72 citations
Aluminium Nitride, Thin Film Physics, Engineering +17
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