Hideharu Shimizu

Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NH<i>x</i> radical formation

Hideharu Shimizu, Kaoru Sakoda, Takeshi Momose et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2011 · 52 citations

Materials Science, Precursor Feed Period, Chemical Engineering +12

CVD of cobalt–tungsten alloy film as a novel copper diffusion barrier

Hideharu Shimizu, Kaoru Sakoda, Yukihiro Shimogaki · Microelectronic Engineering · 2012 · 47 citations

Materials Science, Materials Engineering, Engineering +7

Atomic Layer Deposited Co(W) Film as a Single-Layered Barrier/Liner for Next-Generation Cu-Interconnects

Hideharu Shimizu, Kaoru Sakoda, Takeshi Momose et al. · Japanese Journal of Applied Physics · 2012 · 28 citations

Engineering, Oxidation Resistance, Chemistry +17

Role of NH3 feeding period to realize high-quality nickel films by hot-wire-assisted atomic layer deposition

Guangjie Yuan, Hideharu Shimizu, Takeshi Momose et al. · Microelectronic Engineering · 2013 · 20 citations

Materials Science, Materials Engineering, Engineering +6

Kinetic study on hot-wire-assisted atomic layer deposition of nickel thin films

Guangjie Yuan, Hideharu Shimizu, Takeshi Momose et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2013 · 20 citations

Materials Science, Nickel Thin Films, Chemical Engineering +15