Hye-Keun Oh - Concepedia

Author

Hye-Keun Oh

Hanyang University

Also Known As

Emily Gallagher, Hye-Keun Oh, Hye-Keun Oh Hye-Keun Oh, Hye-keun Oh, Hyekeun Oh, Seung-Woo Son

236

Publications

613

Citations

H-Index

Concepts

All Affiliations

Hanyang University

About

Hye-Keun Oh is an author at Hanyang University specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	8	8	159
2	Applied Physics	5	5	72
3	Medicine	1	1	11
4	Natural Sciences	1	1	22
5	Chemistry	1	1	22

Hye-Keun Oh

Publications

210

Citations

H-Index

Page 1

	Year	Citations
Eco-friendly photolithography using water-developable pure silk fibroin Joonhan Park, Sunggyu Lee, Benedetto Marelli, RSC Advances Materials ScienceEngineeringBeam LithographyPhotochemistryOptical Properties	2016	54
Molecular Modeling of EUV Photoresist Revealing the Effect of Chain Conformation on Line-Edge Roughness Formation Juhae Park, Sunggyu Lee, Yannick Vesters, Polymers	2019	23
Vibrational Predissociation Dynamics of p-Difluorobenzene-N2 Complexes. Comparison with p-Difluorobenzene-Ar Brian D. Gilbert, C. S. Parmenter, Hye-Keun Oh The Journal of Physical Chemistry Molecular SciencesEngineeringPhysicochemical AnalysisDonut IconNatural Sciences	1995	22
Mechanical deflection of a free-standing pellicle for extreme ultraviolet lithography Eun‐Sang Park, Zahid Hussain Shamsi, Jiwon Kim, Microelectronic Engineering Materials ScienceExtreme Ultraviolet LithographyEngineeringElectron-beam LithographyMicrofabrication	2015	17
Resist distribution effect of spin coating Sang-Kon Kim, Ji-Yong Yoo, Hye-Keun Oh Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringMagnetic ResonanceThin Film Process TechnologySpin DynamicMagnetism	2002	16
Resist Pattern Collapse with Top Rounding Resist Profile Hyung-Joo Lee, J.Y. Park, Ji-Yong Yoo, Japanese Journal of Applied Physics Specific ResistanceEngineeringResist Pattern CollapseFlexible ElectronicsMicrofabrication	2003	15
Effect of extreme-ultraviolet pellicle support to patterned mask Ki-Ho Ko, Eunjin Kim, Jiwon Kim, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2012	14
Temperature behavior of pellicles in extreme ultraviolet lithography Hyung-Cheol Lee, Eunjin Kim, Jiwon Kim, Journal of the Korean Physical Society	2012	14
Photoresist Adhesion Effect of Resist Reflow Process Joon-Min Park, Eun‐jin Kim, Jooyoo Hong, Japanese Journal of Applied Physics Materials ScienceEngineeringAdhesion EffectResist ReflowMicrofabrication	2007	13
The effective etch process proximity correction methodology for improving on chip CD variation in 20 nm node DRAM gate Jeong-Geun Park, Sang‐Wook Kim, Seongbo Shim, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Hardware SecurityNon-volatile MemoryElectrical EngineeringPhysical Design (Electronics)Engineering	2011	11

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