H. Seidl

Crystallization behavior of thin ALD-Al2O3 films

S. Jakschik, Uwe Schroeder, T. Hecht et al. · Thin Solid Films · 2003 · 270 citations

Materials Engineering, Materials Science, Aluminium Nitride +7

A comparative study of dielectric relaxation losses in alternative dielectrics

H. Reisinger, G. Steinlesberger, S. Jakschik et al. · 2002 · 58 citations

Gate Dielectrics, Electrical Engineering, Dielectrics +13

Capacitance enhancement techniques for sub-100 nm trench DRAMs

M. Gutsche, H. Seidl, J. Luetzen et al. · 2002 · 23 citations

Materials Engineering, Materials Science, Electrical Engineering +15

Fully depleted surrounding gate transistor (SGT) for 70 nm DRAM and beyond

Bernd Goebel, J. Lützen, D. Manger et al. · 2003 · 20 citations

Non-volatile Memory, Electrical Engineering, Semiconductor Device +14

A fully integrated Al/sub 2/O/sub 3/ trench capacitor DRAM for sub-100 nm technology

H. Seidl, M. Gutsche, Uwe Schroeder et al. · 2003 · 19 citations

Trench Capacitor Dram, Engineering, Emerging Memory Technology +16