Hiroyuki Ueyama - Concepedia

Author

Hiroyuki Ueyama

Saitama University ORCID

Also Known As

H Ueyama, H. Ueyama, Hiroyuki UEYAMA, Hiroyuki Ueyama

Publications

709

Citations

H-Index

Concepts

All Affiliations

Saitama University Kyushu University Kyoto University Canon Anelva (Japan)NEC (Japan)

About

Hiroyuki Ueyama is an author at Saitama University specializing in engineering, electrical engineering, and microfabrication.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	10	11	270
2	Applied Physics	7	7	186
3	Medicine	2	2	340
4	Natural Sciences	2	2	340
5	Education	1	1	20

Hiroyuki Ueyama

Publications

635

Citations

H-Index

Page 1

	Year	Citations
A Novel Potassium Sensing in Aqueous Media with a Synthetic Oligonucleotide Derivative. Fluorescence Resonance Energy Transfer Associated with Guanine Quartet−Potassium Ion Complex Formation Hiroyuki Ueyama, Makoto Takagi, Shigeori Takenaka Journal of the American Chemical Society Molecular BiologyChemistryExcess Na+Novel Potassium SensingBioanalysis	2002	321
New Ultra-High-Frequency Plasma Source for Large-Scale Etching Processes Seiji Samukawa, Yukito Nakagawa, Tsutomu Tsukada, Japanese Journal of Applied Physics Electrical EngineeringLarge-scale Etching ProcessesEngineeringPlasma ElectronicsNew Spokewise Antenna	1995	58
Fast Deposition of Microcrystalline Silicon Using High-Density SiH<sub>4</sub> Microwave Plasma Hajime Shirai, Yoshikazu Sakuma, Yoshimizu Moriya, Japanese Journal of Applied Physics Materials ScienceFast DepositionEngineeringMicrofabricationApplied Physics	1999	40
Low-temperature, uniform, and high-density plasma produced by a new ultra-high-frequency discharge with a spokewise antenna Seiji Samukawa, Yukito Nakagawa, Tsutomu Tsukada, Applied Physics Letters EngineeringPlasma PhysicsUhf PowerPlasma ProcessingPlasma Electronics	1995	39
The Generation of High-Density Microwave Plasma and Its Application to Large-Area Microcrystalline Silicon Thin Film Formation Hajime Shirai, Takeshi Arai, Hiroyuki Ueyama Japanese Journal of Applied Physics EngineeringPlasma PhysicsSih 2Plasma ProcessingPlasma Electronics	1998	39
Accurate Array-Based Measurement for Subthreshold-Current of MOS Transistors Takashi Satō, Hiroyuki Ueyama, Noriaki Nakayama, IEEE Journal of Solid-State Circuits Device ModelingLow-power ElectronicsElectrical EngineeringEngineeringVlsi Design	2009	20
Comparison of potassium ion preference of potassium-sensing oligonucleotides, PSO-1 and PSO-2, carrying the human and Oxytricha telomeric sequence, respectively Shigeori Takenaka, Hiroyuki Ueyama, Takahiko Nojima, Analytical and Bioanalytical Chemistry Molecular PhysiologyPotassium-sensing OligonucleotidesBiochemistryNatural SciencesPhysiology	2003	19
Low temperature formation of microcrystalline silicon films using high-density SiH4 microwave plasma Yoshikazu Sakuma, Haiping Liu, Hajime Shirai, Thin Solid Films Materials ScienceElectrical EngineeringEngineeringMicrofabricationApplied Physics	2001	16
Tetrakis-acridinyl peptide: A novel fluorometric reagent for nucleic acid analysis based on the fluorescence dequenching upon DNA bindingElectronic supplementary information (ESI) available: Synthetic method and data for tetrakis-acridinyl peptide 1 and monomer 2 and spectroscopic data (7 figures). See http://www.rsc.org/suppdata/an/b2/b204019k/ Hiroyuki Ueyama, Makoto Takagi, Shigeori Takenaka The Analyst	2002	15
An Adaptive Test for Parametric Faults Based on Statistical Timing Information Michihiro Shintani, Takumi Uezono, Tomoyuki Takahashi, EngineeringStatistical Timing InformationVerificationSoftware AnalysisFormal Verification	2009	13

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