Larissa Juschkin - Concepedia

Author

Larissa Juschkin

RWTH Aachen University ORCID

Also Known As

Juschkin, Larissa, L Juschkin, L. Juschkin, Larissa Juschkin

107

Publications

787

Citations

H-Index

Concepts

All Affiliations

RWTH Aachen University Fraunhofer Institute for Laser Technology Forschungszentrum Jülich Jülich Aachen Research Alliance University of Southampton

About

Larissa Juschkin is an author at RWTH Aachen University specializing in engineering, applied physics, and optical properties.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	14	19	389
2	Applied Physics	13	15	313
3	Natural Sciences	7	7	141
4	Health Sciences	3	3	60
5	Chemistry	2	2	30

Larissa Juschkin

Publications

542

Citations

H-Index

Page 1

	Year	Citations
Fundamentals and limits for the EUV emission of pinch plasma sources for EUV lithography Thomas Krücken, K. Bergmann, Larissa Juschkin, Journal of Physics D Applied Physics	2004	70
Optimization of a gas discharge plasma source for extreme ultraviolet interference lithography at a wavelength of 11 nm K. Bergmann, Serhiy Danylyuk, Larissa Juschkin Journal of Applied Physics Short Wavelength OpticOptical MaterialsEngineeringPlasma PhysicsPlasma Combustion	2009	42
Broadband transmission masks, gratings and filters for extreme ultraviolet and soft X-ray lithography Sascha Brose, Serhiy Danylyuk, Larissa Juschkin, Thin Solid Films PhotonicsEngineeringElectron-beam LithographyBeam LithographyMicrofabrication	2012	31
EUV microscopy for defect inspection by dark-field mapping and zone plate zooming Larissa Juschkin, Ralf Freiberger, K. Bergmann Journal of Physics Conference Series	2009	31
Ptychographic imaging with a compact gas–discharge plasma extreme ultraviolet light source Michal Odstrčil, D. Rudolf, R. Bresenitz, Optics Letters Ultraviolet LightEngineeringHealth SciencesOphthalmologyMicroscopy	2015	31
EUV emission from Kr and Xe capillary discharge plasmas Larissa Juschkin, A. S. Chuvatin, S. V. Zakharov, Journal of Physics D Applied Physics Xe EmissionExtreme UtravioletEngineeringPhysicsNatural Sciences	2002	29
Scalability limits of Talbot lithography with plasma-based extreme ultraviolet sources Serhiy Danylyuk, Peter Loosen, K. Bergmann, Journal of Micro/Nanolithography MEMS and MOEMS EngineeringElectron-beam LithographyMicroscopyTalbot LithographyPlasma Processing	2013	29
Table-top reflectometer in the extreme ultraviolet for surface sensitive analysis Matus Banyay, Larissa Juschkin Applied Physics Letters Ultraviolet LightOptical MaterialsEngineeringThin Film AnalysisOptical Testing	2009	27
Achromatic Talbot lithography with partially coherent extreme ultraviolet radiation: process window analysis Sascha Brose, Jenny Tempeler, Serhiy Danylyuk, Journal of Micro/Nanolithography MEMS and MOEMS Short Wavelength OpticEngineeringElectron-beam LithographyOptic DesignPlasma Processing	2016	23
<title>Comparison of different source concepts for EUVL</title> R. Lebert, K. Bergmann, Larissa Juschkin, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Electrical EngineeringEngineeringConversion EfficiencyMarkup LanguageDifferent Source Concepts	2001	21

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