Concepedia

Larissa Juschkin

LJ

25

Publications

542

Citations

16

H-Index

2001

Active since

Affiliations

RWTH Aachen University(Current)

Fraunhofer Institute for Laser Technology

Forschungszentrum Jülich

Jülich Aachen Research Alliance

University of Southampton

Larissa Juschkin is an author at RWTH Aachen University specializing in engineering, applied physics, and optical properties.

ORCID

Top concepts

Publications per year

2001–2023

25

Publications

25

Fundamentals and limits for the EUV emission of pinch plasma sources for EUV lithography

Thomas Krücken, K. Bergmann, Larissa Juschkin et al. · Journal of Physics D Applied Physics · 2004 · 70 citations

Optimization of a gas discharge plasma source for extreme ultraviolet interference lithography at a wavelength of 11 nm

K. Bergmann, Serhiy Danylyuk, Larissa Juschkin · Journal of Applied Physics · 2009 · 42 citations

, , +18

Broadband transmission masks, gratings and filters for extreme ultraviolet and soft X-ray lithography

Sascha Brose, Serhiy Danylyuk, Larissa Juschkin et al. · Thin Solid Films · 2012 · 31 citations

, , +11

EUV microscopy for defect inspection by dark-field mapping and zone plate zooming

Larissa Juschkin, Ralf Freiberger, K. Bergmann · Journal of Physics Conference Series · 2009 · 31 citations · Full text

Ptychographic imaging with a compact gas–discharge plasma extreme ultraviolet light source

Michal Odstrčil, D. Rudolf, R. Bresenitz et al. · Optics Letters · 2015 · 31 citations · Full text

, , +14

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