Statistics
Publications
55
Citations
3.2K
H-Index
24
Active since
1998
Conal E. Murray is an author at IBM (United States) specializing in engineering, applied physics, and materials science.
Publications per year
1998–2022
55
55
High-mobility ultrathin semiconducting films prepared by spin coating
David B. Mitzi, Laura L. Kosbar, Conal E. Murray et al. · Nature · 2004 · 518 citations
Liner materials for direct electrodeposition of Cu
Michael Lane, Conal E. Murray, F. R. McFeely et al. · Applied Physics Letters · 2003 · 162 citations
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