Statistics
Publications
55
Citations
3.3K
H-Index
25
Active since
1998
Conal E. Murray is an author at IBM (United States) specializing in materials science, materials engineering, and natural sciences.
Publications per year
1998–2022
55
55
Review Article: Stress in thin films and coatings: Current status, challenges, and prospects
G. Abadias, Eric Chason, Jozef Kečkéš et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2018 · 820 citations · Full text
Natural Sciences, Materials Engineering, Materials Science +17
High-mobility ultrathin semiconducting films prepared by spin coating
David B. Mitzi, Laura L. Kosbar, Conal E. Murray et al. · Nature · 2004 · 522 citations
Liner materials for direct electrodeposition of Cu
Michael Lane, Conal E. Murray, F. R. McFeely et al. · Applied Physics Letters · 2003 · 162 citations
Natural Sciences, Materials Engineering, Materials Science +15
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