R. J. Purtell - Concepedia

Author

R. J. Purtell

IBM Research - Thomas J. Watson Research Center

Also Known As

R. J. Purtell, R. Purtell, R.J. Purtell, Robert J. Purtell, Robert Purtell

Publications

524

Citations

H-Index

Concepts

All Affiliations

IBM Research - Thomas J. Watson Research Center Cornell University IBM (United States)

About

R. J. Purtell is an author at IBM Research - Thomas J. Watson Research Center specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	10	10	443
2	Applied Physics	7	7	255
3	Medicine	1	1	32
4	Natural Sciences	1	1	59
5	Chemical Engineering	1	1	32

R. J. Purtell

Publications

443

Citations

H-Index

Page 1

	Year	Citations
Chemisorption and reaction of NH3 on Ni(111) C.W. Seabury, T. N. Rhodin, R. J. Purtell, Surface Science Inorganic ChemistryEngineeringChemisorptionAmmoniaChemistry	1980	140
Molecular Adsorbate Structures from Angular-Resolved Photoemission: Ammonia on Ir(111) R. J. Purtell, Robert P. Merrill, C.W. Seabury, Physical Review Letters EngineeringThreefold HollowChemistryElectronic StructureSpectroscopic Property	1980	59
A high performance 90nm SOI technology with 0.992 μm/sup 2/ 6T-SRAM cell Mukesh Khare, S.H. Ku, R. A. Donaton, Low-power ElectronicsMaterials ScienceElectrical EngineeringHigh Performance 90NmSoi Technology	2003	43
Chemical reaction and silicide formation at the Pt/Si interface R. Matz, R. J. Purtell, Y. Yokota, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringUps SpectrumChemistrySilicon On InsulatorSurface Technology	1984	43
The formation of the Schottky barrier at the V/Si interface J. G. Clabes, Gary W. Rubloff, B. Reihl, Journal of Vacuum Science and Technology Materials ScienceSemiconductorsElectrical EngineeringV CoverageEngineering	1982	38
Precision parts cleaning using supercritical fluids R. J. Purtell, Laura Rothman, Benjamin N. Eldridge, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Solvent ExtractionEngineeringSupercritical Fluid ChromatographyMechanical EngineeringChemistry	1993	32
Schottky barrier formation at Pd, Pt, and Ni/Si(111) interfaces R. J. Purtell, G. Hollinger, Gary W. Rubloff, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceSemiconductorsSemiconductor TechnologySchottky Barrier HeightEngineering	1983	28
A mechanistic study of SF6/O2 reactive ion etching of molybdenum Seong‐Ju Park, Chung-ping Sun, R. J. Purtell Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena Materials ScienceSurface CharacterizationApplied ChemistryEngineeringNanotechnology	1987	25
Summary Abstract: Schottky barrier formation at Pd/Si(111) and V/Si(111) interfaces R. J. Purtell, J. G. Clabes, Gary W. Rubloff, Journal of Vacuum Science and Technology Materials ScienceEngineeringSurface ScienceApplied PhysicsSemiconductor Material	1982	19
Summary Abstract: Structure and bonding of ammonia chemisorbed on nickel (111) from angle-resolved photoemission C.W. Seabury, T. N. Rhodin, R. J. Purtell, Journal of Vacuum Science and Technology Materials ScienceInorganic ChemistryEngineeringInorganic PhotochemistryAngle-resolved Photoemission	1981	16

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