Statistics
Publications
13
Citations
370
H-Index
11
Active since
1966
Affiliations
Hitachi (Japan)(Current)
Osami Okada is an author at Hitachi (Japan) specializing in engineering, applied physics, and surface science.
Publications per year
1966–2001
13
13
Reaction of atomic fluorine with silicon
Ken Ninomiya, Keizô Suzuki, Shigeru Nishimatsu et al. · Journal of Applied Physics · 1985 · 72 citations
Role of sulfur atoms in microwave plasma etching of silicon
Ken Ninomiya, Keizô Suzuki, Shigeru Nishimatsu et al. · Journal of Applied Physics · 1987 · 33 citations
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