Statistics
Publications
5
Citations
108
H-Index
5
Active since
2016
Affiliations
Deutsche Telekom (Austria)(Current)
G. Strof is an author at Deutsche Telekom (Austria) specializing in semiconductor devices, device simulation, and device modeling.
Publications per year
2016–2023
5
5
Effect of Mask Geometry Variation on Plasma Etching Profiles
Josip Bobinac, Tobias Reiter, Julius Piso et al. · Micromachines · 2023 · 26 citations · Full text
Engineering, Electrical Engineering, Materials Engineering +17
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