R. A. Rudder - Concepedia

Author

R. A. Rudder

RTI International

Also Known As

R. A Rudder, R. A. RUDDER, R. A. Rudder, R. Rudder, R.A. RUDDER, R.A. Rudder, Ronald A. Rudder

101

Publications

1.8K

Citations

H-Index

Concepts

All Affiliations

RTI International North Carolina State University Research Triangle Park Foundation

About

R. A. Rudder is an author at RTI International specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	22	39	1.5K
2	Applied Physics	21	37	1.5K
3	Chemical Engineering	9	9	305
4	Chemistry	9	9	453
5	Natural Sciences	4	4	304

R. A. Rudder

Publications

1.7K

Citations

H-Index

Page 1

	Year	Citations
Thermal desorption from hydrogenated and oxygenated diamond (100) surfaces R. E. Thomas, R. A. Rudder, R. J. Markunas Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringChemistryMolecular HydrogenThermal DesorptionMaterials Science	1992	222
Single-crystal diamond plate liftoff achieved by ion implantation and subsequent annealing N.R. Parikh, John Hunn, E. McGucken, Applied Physics Letters Materials EngineeringMaterials ScienceDiamond-like CarbonIon ImplantationEngineering	1992	152
On the feasibility of growing dilute C<i>x</i>Si1−<i>x</i> epitaxial alloys J. B. Posthill, R. A. Rudder, S. V. Hattangady, Applied Physics Letters Materials EngineeringMaterials ScienceSemiconductorsGrowth TemperatureEngineering	1990	91
Remote plasma-enhanced chemical-vapor deposition of epitaxial Ge films R. A. Rudder, G. G. Fountain, R. J. Markunas Journal of Applied Physics Materials ScienceDeposition Precursor SpeciesEpitaxial GrowthEngineeringGe Epitaxy	1986	79
Direct deposition of polycrystalline diamond films on Si(100) without surface pretreatment R. A. Rudder, G. Hudson, J. B. Posthill, Applied Physics Letters EngineeringSolid-state ChemistryChemical DepositionSilicon On InsulatorNanoengineering	1991	72
GaAs MIS structures with SiO <sub>2</sub> using a thin silicon interlayer G. G. Fountain, S. V. Hattangady, D. J. Vitkavage, Electronics Letters	1988	66
Low interface state density SiO2 deposited at 300 °C by remote plasma-enhanced chemical vapor deposition on reconstructed Si surfaces G. G. Fountain, R. A. Rudder, S. V. Hattangady, Journal of Applied Physics Materials ScienceSemiconductorsElectrical EngineeringReconstructed Si SurfacesEngineering	1988	60
High photoconductivity in magnetron sputtered amorphous hydrogenated germanium films R. A. Rudder, J. W. Cook, G. Lucovsky Applied Physics Letters Optical MaterialsEngineeringOptoelectronic DevicesGermanium FilmsSemiconductors	1983	56
Carbon and oxygen removal from silicon (100) surfaces by remote plasma cleaning techniques R. E. Thomas, M. J. Mantini, R. A. Rudder, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringChemistryPlasma ProcessingChemical EngineeringHydrogen Plasma	1992	51
Chemical vapor deposition of diamond films from water vapor rf-plasma discharges R. A. Rudder, G. Hudson, J. B. Posthill, Applied Physics Letters EngineeringVacuum DevicePlasma ProcessingChemical EngineeringNanoengineering	1992	48

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