Leila Costelle

Lanthanum titanate and lithium lanthanum titanate thin films grown by atomic layer deposition

Titta Aaltonen, Mari Alnes, Ola Nilsen et al. · Journal of Materials Chemistry · 2010 · 99 citations

Materials Science, Lanthanum Deposition Rate, Epitaxial Growth +11

Growth and phase stabilization of HfO2 thin films by ALD using novel precursors

Jaakko Niinistö, Miia Mäntymäki, Kaupo Kukli et al. · Journal of Crystal Growth · 2009 · 83 citations

Materials Science, Materials Engineering, Aluminium Nitride +9

Atomic Layer Deposition of Iridium Thin Films by Consecutive Oxidation and Reduction Steps

Jani Hämäläinen, Esa Puukilainen, Marianna Kemell et al. · Chemistry of Materials · 2009 · 54 citations

Optical Materials, Engineering, Oxidation Resistance +16

Mechanism of surface modification in the plasma-surface interaction in electrical arcs

H. Timko, Flyura Djurabekova, K. Nordlund et al. · Physical Review B · 2010 · 50 citations · Full text

Engineering, Glow Discharge, Plasma Processing +16

(MeCp)Ir(CHD) and molecular oxygen as precursors in atomic layer deposition of iridium

Jani Hämäläinen, Timo Hatanpää, Esa Puukilainen et al. · Journal of Materials Chemistry · 2010 · 40 citations

Crystal Structure, Engineering, Molecular Oxygen +21