Publication | Closed Access
Growth and phase stabilization of HfO2 thin films by ALD using novel precursors
83
Citations
23
References
2009
Year
Materials ScienceMaterials EngineeringAluminium NitrideEngineeringSurface ScienceApplied PhysicsThin FilmsChemical Vapor DepositionEpitaxial GrowthNovel PrecursorsHfo2 Thin FilmsThin Film Processing
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