Sai Hooi Yeong - Concepedia

Author

Sai Hooi Yeong

Taiwan Semiconductor Manufacturing Company (Taiwan)

Also Known As

S. H. Yeong, Sai Hooi Yeong

Publications

130

Citations

H-Index

Concepts

All Affiliations

Taiwan Semiconductor Manufacturing Company (Taiwan)National Yang Ming Chiao Tung University Stanford University

About

Sai Hooi Yeong is an author at Taiwan Semiconductor Manufacturing Company (Taiwan) specializing in engineering, materials science, and electrical engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	5	5	120
2	Materials Science	5	5	120
3	Applied Physics	4	4	107
4	Electrical Engineering	4	4	106
5	Materials Engineering	2	2	60

Sai Hooi Yeong

Publications

130

Citations

H-Index

Page 1

	Year	Citations
ZrO<sub>2</sub>-HfO<sub>2</sub> Superlattice Ferroelectric Capacitors With Optimized Annealing to Achieve Extremely High Polarization Stability Yan-Kui Liang, Weili Li, Yong-Jyun Wang, IEEE Electron Device Letters Materials ScienceMaterials EngineeringElectrical EngineeringMultiferroicsEngineering	2022	46
Electrical Characteristics of Ultrathin InZnO Thin-Film Transistors Prepared by Atomic Layer Deposition Yan-Kui Liang, Jing-Wei Lin, Li-Chi Peng, IEEE Transactions on Electron Devices Materials ScienceElectrical CharacteristicsElectrical EngineeringElectronic DevicesEngineering	2023	33
CeO<sub>2</sub> Doping of Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> Thin Films for High Endurance Ferroelectric Memories Zhouchangwan Yu, Balreen Saini, Pei‐Jean Liao, Advanced Electronic Materials Materials ScienceCeo 2Electrical EngineeringEngineeringFerroelectric Application	2022	14
Effects of Annealing Temperature on TiN/Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub>/TiN Ferroelectric Capacitor Prepared by <i>In-Situ</i> Like Consecutive Atomic Layer Deposition Yan-Kui Liang, Yi-Shuo Huang, Li-Chi Peng, IEEE Transactions on Nanotechnology Materials ScienceMaterials EngineeringMaterial AnalysisHigher Pma TemperatureEngineering	2022	14
Characterization of Ferroelectric Characteristics for Hafnium Zirconium Oxide Capacitors with Refractory Electrodes Yan-Kui Liang, Jing-Wei Lin, Yi-Shuo Huang, ECS Journal of Solid State Science and Technology Materials ScienceElectrical EngineeringEngineeringFerroelectric ApplicationFerroelectric Characteristics	2022	13
The Field-dependence Endurance Model and Its Mutual Effect in Hf-based Ferroelectrics Yu-Kai Chang, P. J. Liao, Sai Hooi Yeong, 2022 IEEE International Reliability Physics Symposium (IRPS)	2022	10

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