Jürgen Erlekampf

Statistics

Publications

Citations

179

H-Index

Active since

2012

Affiliations

Fraunhofer Institute for Integrated Systems and Device Technology(Current)

Schott (Germany)

Friedrich-Alexander-Universität Erlangen-Nürnberg

Jürgen Erlekampf is an author at Fraunhofer Institute for Integrated Systems and Device Technology specializing in semiconductor devices, materials science, and semiconductor materials.

Publications per year

2012–2019

Publications

Laser Writing of Scalable Single Color Centers in Silicon Carbide

Y.-C. Chen, Patrick S. Salter, Matthias Niethammer et al. · Nano Letters · 2019 · 127 citations

Engineering, Materials Engineering, Materials Science +17

Numerical time-dependent 3D simulation of flow pattern and heat distribution in an ammonothermal system with various baffle shapes

Jürgen Erlekampf, Jan Seebeck, Petros G. Savva et al. · Journal of Crystal Growth · 2014 · 22 citations

Engineering, Mechanical Engineering, Physics +17

Deeper insight into lifetime-engineering in 4H-SiC by ion implantation

Jürgen Erlekampf, Birgit Kallinger, Mathias Rommel et al. · Journal of Applied Physics · 2019 · 16 citations

Engineering, Materials Engineering, Materials Science +17

Characterization of grain boundaries in multicrystalline silicon with high lateral resolution using conductive atomic force microscopy

Maximilian Rumler, Mathias Rommel, Jürgen Erlekampf et al. · Journal of Applied Physics · 2012 · 14 citations · Full text

Natural Sciences, Materials Science, Physics +17

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