Rahul Suri

A 10nm high performance and low-power CMOS technology featuring 3^rd generation FinFET transistors, Self-Aligned Quad Patterning, contact over active gate and cobalt local interconnects

C. Auth, A. Aliyarukunju, M. Asoro et al. · 2017 · 353 citations

Engineering, Integrated Circuits, High Performance +18

Energy-band alignment of Al2O3 and HfAlO gate dielectrics deposited by atomic layer deposition on 4H–SiC

Rahul Suri, Casey Kirkpatrick, Daniel J. Lichtenwalner et al. · Applied Physics Letters · 2010 · 73 citations

Materials Science, Semiconductors, Electrical Engineering +14

Interfacial self cleaning during atomic layer deposition and annealing of HfO2 films on native (100)-GaAs substrates

Rahul Suri, Daniel J. Lichtenwalner, Veena Misra · Applied Physics Letters · 2010 · 57 citations

Engineering, Chemical Deposition, Interfacial Self +22

Atomic Layer Deposition of $\hbox{SiO}_{2}$ for AlGaN/GaN MOS-HFETs

Casey Kirkpatrick, Bongmook Lee, Rahul Suri et al. · IEEE Electron Device Letters · 2012 · 39 citations

Oxide Heterostructures, Semiconductors, Electrical Engineering +11

Properties of atomic layer deposited dielectrics for AlGaN/GaN device passivation

Narayanan Ramanan, Bongmook Lee, Casey Kirkpatrick et al. · Semiconductor Science and Technology · 2013 · 30 citations

Semiconductors, Wide-bandgap Semiconductor, Electrical Engineering +12