Statistics
Publications
18
Citations
500
H-Index
13
Active since
2001
L.J. Tang is an author at Institute of Microelectronics specializing in engineering, applied physics, and materials engineering.
Publications per year
2001–2024
18
18
A new method for deposition of cubic Ta diffusion barrier for Cu metallization
Zifeng Yuan, D.H. Zhang, C.Y. Li et al. · Thin Solid Films · 2003 · 47 citations
Breakdowns in high-k gate stacks of nano-scale CMOS devices
K. L. Pey, Rakesh Ranjan, Ching‐Hsuan Tung et al. · Microelectronic Engineering · 2005 · 34 citations
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