Y. Matsubara

Application of Fluorinated Amorphous Carbon Thin Films for Low Dielectric Constant Interlayer Dielectrics

Kazuhiko Endo, Toru Tatsumi, Y. Matsubara et al. · Japanese Journal of Applied Physics · 1998 · 35 citations

Natural Sciences, Materials Engineering, Materials Science +17

Atomic layer epitaxy of GaAs using triethylgallium and arsine

Hideo Ohno, Shunsuke Ohtsuka, Hisayoshi Ishii et al. · Applied Physics Letters · 1989 · 35 citations

Engineering, Electrical Engineering, Materials Science +12

Activation energy for the <i>C</i>49-to-<i>C</i>54 phase transition of polycrystalline TiSi2 films with arsenic impurities

Y. Matsubara, T. Horiuchi, Koichiro Okumura · Applied Physics Letters · 1993 · 31 citations

Engineering, Materials Engineering, Materials Science +17

65 nm CMOS technology (CMOS5) with high density embedded memories for broadband microprocessor applications

N. Yanagiya, Shôichi Matsuda, S. Inaba et al. · 2003 · 23 citations

Engineering, Computer Engineering, Electrical Engineering +17

Deposition of silicon dioxide films on amorphous carbon films by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

Kazuhiko Endo, Toru Tatsumi, Y. Matsubara · Applied Physics Letters · 1997 · 14 citations

Natural Sciences, Materials Engineering, Materials Science +17