Shinji Kishimura

New Photoresist Materials for 157-nm Lithography. Poly[Vinylsulfonyl Fluoride-<i>c</i><i>o</i>-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)-styrene] Partially Protected with <i>tert-</i>Butoxycarbonyl

Tsuyohiko Fujigaya, Yuji Sibasaki, Shinji Ando et al. · Chemistry of Materials · 2003 · 29 citations

Natural Sciences, Chemistry, Materials Science +17

A New Photoresist Material for 157 nm Lithography-2.

Tsuyohiko Fujigaya, Shinji Ando, Yuji Shibasaki et al. · Journal of Photopolymer Science and Technology · 2002 · 17 citations · Full text

Natural Sciences, Chemistry, Materials Science +13

Immersion specific defect mechanisms: findings and recommendations for their control

Michael Kocsis, Dieter Van den Heuvel, Roel Gronheid et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 16 citations

Natural Sciences, Manufacturing Engineering, Materials Science +17

Design Concepts of Single-Layer Resists for Vacuum Ultraviolet Lithography

Shinji Kishimura, Akiko Katsuyama, Masaru Sasago et al. · Japanese Journal of Applied Physics · 1999 · 13 citations

Natural Sciences, Materials Engineering, Materials Science +8

157nm Single-Layer and Bilayer Resists Based on .ALPHA.-Methylstyrene Polymers.

Masamitsu Shirai, Toyofumi Shinozuka, Haruyuki Okamura et al. · Journal of Photopolymer Science and Technology · 2001 · 11 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +11