K. Torek

Reduced Pressure Etching of Thermal Oxides in Anhydrous  HF  / Alcoholic Gas Mixtures

K. Torek, R. F. Grant, R. Novak · Journal of The Electrochemical Society · 1995 · 43 citations

Engineering, Methanol, Experimental Thermodynamics +19

Etching of Thermal Oxides in Low Pressure Anhydrous  HF  /  CH 3 OH  Gas Mixture at Elevated Temperature

K. Torek, C.R. Daffron, R. F. Grant et al. · Journal of The Electrochemical Society · 1993 · 36 citations

Materials Science, Chemical Engineering, Engineering +14

Etching mechanism of the single-step through-silicon-via dry etch using SF6/C4F8 chemistry

Zihao Ouyang, D. N. Ruzic, Mark Kiehlbauch et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2014 · 31 citations

Engineering, Sidewall Smoothness, Plasma Physics +18

Surface dopant concentration monitoring using noncontact surface charge profiling

P. Roman, J. Staffa, S. Fakhouri et al. · Journal of Applied Physics · 1998 · 17 citations

Engineering, Cubic Boron Nitride, Chemical Engineering +16

In Situ Vapor Phase Pregate Oxide Cleaning and Its Effects on Metal‐Oxide‐Semiconductor Device Characteristics

Yuhang Ma, M. L. Green, K. Torek et al. · Journal of The Electrochemical Society · 1995 · 13 citations

Materials Science, Semiconductor Technology, Electrical Engineering +15