Satoshi Hasaka

Molecular modeling of low-k films of carbon-doped silicon oxides for theoretical investigations of the mechanical and dielectric properties

Nobuo Tajima, Takahisa Ohno, Tomoyuki Hamada et al. · Applied Physics Letters · 2006 · 34 citations

Engineering, Chemistry, Silicon On Insulator +20

Carbon-Doped Silicon Oxide Films with Hydrocarbon Network Bonds for Low-k Dielectrics: Theoretical Investigations

Nobuo Tajima, Takahisa Ohno, Tomoyuki Hamada et al. · Japanese Journal of Applied Physics · 2007 · 29 citations

Engineering, Organic Electronics, Hydrocarbon Components +20

Etching of High-k Dielectric HfO₂ Films in BCl₃-Containing Plasmas Enhanced with O₂ Addition

Tomohiro Kitagawa, K. Nakamura, Kazushi Osari et al. · Japanese Journal of Applied Physics · 2006 · 29 citations

Engineering, Plasmas Enhanced, Silicon On Insulator +16

Novel Precursor for Development of Si–C₂H₄–Si Networks in SiCH for Application as a Low-k Cap Layer beyond 22 nm Nodes

Hideharu Shimizu, Nobuo Tajima, Takeshi Kada et al. · Japanese Journal of Applied Physics · 2010 · 17 citations

Low-k Cap Layer, Engineering, Chemistry +17

Gas phase particle formation and elimination on Si (100) in low temperature reduced pressure chemical vapor deposition silicon-based epitaxial layers

Manabu Shinriki, Keith Chung, Satoshi Hasaka et al. · Thin Solid Films · 2011 · 16 citations

Materials Engineering, Engineering, Surface Science +7