J. W. Irving is an author at Canon (United States) specializing in nanolithography, engineering, and microfabrication.
Top concepts
EngineeringApplied PhysicsNanofabricationNanolithographyMicroelectronicsMicrofabricationElectrical Engineering3D PrintingMicrofluidicsNanoelectronics
Publications per year
2013–2016
4
4
Defect reduction for semiconductor memory applications using jet and flash imprint lithography
Zhengmao Ye, Kang Luo, J. W. Irving et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 27 citations
Engineering, Electron-beam Lithography, Emerging Memory Technology +23
High throughput Jet and Flash Imprint Lithography for semiconductor memory applications
Wei Zhang, Brian Fletcher, Ecron Thompson et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 18 citations
Engineering, Electron-beam Lithography, Emerging Memory Technology +27
High-throughput jet and flash imprint lithography for advanced semiconductor memory
Niyaz Khusnatdinov, Zhengmao Ye, Kang Luo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 16 citations
Engineering, Electron-beam Lithography, Emerging Memory Technology +22
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