George R. Misium

Macroscopic modeling of radio-frequency plasma discharges

George R. Misium, A. J. Lichtenberg, M. A. Lieberman · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1989 · 88 citations · Full text

Engineering, Glow Discharge, Plasma Science +17

A Ti salicide process for 0.10 μm gate length CMOS technology

J. A. Kittl, Qi‐Zhong Hong, M. Redder et al. · 2002 · 25 citations

Low-power Electronics, Electrical Engineering, Engineering +9

High-performance metal/silicide antifuse (for CMOS technology)

S.-J. Wang, George R. Misium, Janay Camp et al. · IEEE Electron Device Letters · 1992 · 16 citations

Materials Science, Electrical Engineering, Engineering +9

Manufacturability Issues Of The DESIRE Process

César M. Garza, George R. Misium, R.R. Doering et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1989 · 13 citations

Desire Process, Engineering, Optic Design +19

Modeling of Device Characteristics as Function of Ti Salicide Rapid Thermal Processing Parameters for Deep-Sub-Micron CMOS Technologies

J. A. Kittl, Douglas A. Prinslow, George R. Misium et al. · MRS Proceedings · 1996 · 11 citations

Electrical Engineering, Engineering, Vlsi Design +12