Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1989 · 13 citations · 0 references
EngineeringManufacturing EngineeringManufacturing ProcessesMicrofabricationSemiconductor DevicesManufacturing Process PlanningSurface MetrologyDevice FabricationHigh-volume ApplicationManufacturabilityManufacturability ConstraintsManufacturingOptical LithographyPerformance CharacterizationVolume Production
Surface-imaging schemes are an attractive alternative to overcome many of the limitations optical microlithography is presently facing. A good example of this type of approach is the so-called DESIRE process. A preliminary performance characterization of the DESIRE process showed a significant increase in resolution and process latitude. However, new process variables must be understood and technical challenges overcome before this process can be successfully implemented in a manufacturing environment. The purpose of this paper is to explore these new process variables and suggest solutions for the implementation of the DESIRE process in high-volume production of semiconductor devices.© (1989) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.