Statistics
Publications
5
Citations
123
H-Index
5
Active since
1980
Affiliations
Fuji Xerox (Japan)(Current)
Toshihisa Hamano is an author at Fuji Xerox (Japan) specializing in materials science, semiconductor devices, and electrical engineering.
Publications per year
1980–1993
5
5
Morphology of SiSiO2 interface
Takuo Sugano, Jon Chen Jen, Toshihisa Hamano · Surface Science · 1980 · 36 citations
Natural Sciences, Materials Engineering, Materials Science +10
An Amorphous Si High Speed Linear Image Sensor
Toshihisa Hamano, Hisao Ito, T. Nakamura et al. · Japanese Journal of Applied Physics · 1982 · 28 citations · Full text
Degradation mechanism of polysilicon TFTs under DC stress
Noriji Kato, Takayuki Yamada, So Yamada et al. · 1992 · 17 citations
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