Andrew Ritenour

Flexible active-matrix electronic ink display

Y. Chen, Joanna Au, Peter T. Kazlas et al. · Nature · 2003 · 597 citations

Engineering, Materials Engineering, Materials Science +12

Ge diffusion in Ge metal oxide semiconductor with chemical vapor deposition HfO2 dielectric

N. Lu, Weiping Bai, A. Ramí­rez et al. · Applied Physics Letters · 2005 · 125 citations

Engineering, Electrical Engineering, Materials Science +16

Subnanometer-equivalent-oxide-thickness germanium p-metal-oxide-semiconductor field effect transistors fabricated using molecular-beam-deposited high-k/metal gate stack

Andrew Ritenour, A. Khakifirooz, D.A. Antoniadis et al. · Applied Physics Letters · 2006 · 73 citations

Engineering, Electrical Engineering, Materials Science +17

Atomic layer deposition of insulating nitride interfacial layers for germanium metal oxide semiconductor field effect transistors with high-κ oxide/tungsten nitride gate stacks

Kyoung H. Kim, Roy G. Gordon, Andrew Ritenour et al. · Applied Physics Letters · 2007 · 66 citations

Engineering, Materials Engineering, Materials Science +17

Ge MOS characteristics with CVD HfO/sub 2/ gate dielectrics and TaN gate electrode

Weiping Bai, N. Lu, J. Liu et al. · 2004 · 64 citations

Engineering, Electrical Engineering, Materials Science +17