Y. H. Lee

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Active since

1989

Affiliations

IBM Research - Thomas J. Watson Research Center(Current)

Y. H. Lee is an author at IBM Research - Thomas J. Watson Research Center specializing in reactive ion etching, materials science, and microelectronics.

Publications per year

1989–1990

Publications

Comparison of damage in the dry etching of GaAs by conventional reactive ion etching and by reactive ion etching with an electron cyclotron resonance generated plasma

Rebecca Cheung, Y. H. Lee, K. Y. Lee et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1989 · 28 citations

Engineering, Electrical Engineering, Materials Science +17

Chemical sputtering of Al2O3 by fluorine-containing plasmas excited by electron cyclotron resonance

Y. H. Lee, Zhen‐Hong Zhou, D. A. Danner et al. · Journal of Applied Physics · 1990 · 18 citations

Natural Sciences, Materials Science, Physics +9

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