Concepedia

K. Y. Lee

KY

Statistics

Publications

2

Citations

54

H-Index

2

Active since

1989

Affiliations

IBM Research - Thomas J. Watson Research Center(Current)

K. Y. Lee is an author at IBM Research - Thomas J. Watson Research Center specializing in reactive ion etching, etch damage, and materials science.

Publications per year

1989–1989

2

Publications

2

Comparison of damage in the dry etching of GaAs by conventional reactive ion etching and by reactive ion etching with an electron cyclotron resonance generated plasma

Rebecca Cheung, Y. H. Lee, K. Y. Lee et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1989 · 28 citations

Engineering, Electrical Engineering, Materials Science +17

Sidewall damage in <i>n</i>+-GaAs quantum wires from reactive ion etching

Rebecca Cheung, Y. H. Lee, C. M. Knoedler et al. · Applied Physics Letters · 1989 · 26 citations

Engineering, Materials Science, Physics +17

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