Bob Gleason

Trade-off between inverse lithography mask complexity and lithographic performance

Byung‐Gook Kim, Sung Soo Suh, Byung Sung Kim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 58 citations

Engineering, Electrical Engineering, Manufacturing Engineering +11

Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO)

Linyong Pang, Guangming Xiao, Vikram Tolani et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 34 citations

Engineering, Computer Engineering, Design Optimization +13

Source-mask co-optimization (SMO) using level set methods

Vikram Tolani, Peter Hu, Danping Peng et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 23 citations

Computing, Computer Science, Algorithms +10

Source mask optimization (SMO) at full chip scale using inverse lithography technology (ILT) based on level set methods

Linyong Pang, Peter Hu, Danping Peng et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 22 citations

Engineering, Computer Engineering, Electrical Engineering +7

Source optimization and mask design to minimize MEEF in low k 1 lithography

Guangming Xiao, Tom Cecil, Lingyong Pang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 15 citations

Architecture, Digital Design, Computer-aided Design +7