Concepedia
Statistics
Publications
2
Citations
36
H-Index
Active since
2008
Affiliations
Lawrence Berkeley National Laboratory(Current)
Charles D. Kemp is an author at Lawrence Berkeley National Laboratory specializing in mask design, engineering, and line roughness.
Publications per year
2008–2010
Actinic extreme ultraviolet mask inspection beyond 0.25numericalaperture
Kenneth A. Goldberg, Patrick Naulleau, Iacopo Mochi et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2008 · 22 citations
Engineering, Mechatronics Engineering, Digital Imaging +12
Assessing out-of-band flare effects at the wafer level for EUV lithography
Simi George, Patrick Naulleau, Charles D. Kemp et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 14 citations
Engineering, Electrical Engineering, Microelectronics +11
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