David Van Steenwinckel

Lithographic importance of acid diffusion in chemically amplified resists

David Van Steenwinckel, Jeroen H. Lammers, Leonardus H. A. Leunissen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 72 citations

Engineering, Materials Engineering, Contrast Sensitivity +12

Resist effects at small pitches

David Van Steenwinckel, Jeroen H. Lammers, Thomas Koehler et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2006 · 40 citations

Engineering, Materials Engineering, Materials Science +13

Influence of the chromophore ionization potential on speed and magnitude of photorefractive effects in poly(N-vinylcarbazole) based polymer composites

David Van Steenwinckel, Eric Hendrickx, André Persoons et al. · The Journal of Chemical Physics · 2000 · 36 citations

Natural Sciences, Chemistry, Materials Science +17

A novel method for characterizing resist performance

David Van Steenwinckel, Roel Gronheid, Jeroen H. Lammers et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 34 citations

Natural Sciences, Materials Engineering, Materials Science +12

Efficient fully functionalized photorefractive polymethacrylates with infrared sensitivity and different spacer lengths

Christiaan Engels, David Van Steenwinckel, Eric Hendrickx et al. · Journal of Materials Chemistry · 2002 · 33 citations

Natural Sciences, Materials Engineering, Materials Science +17