F. Milde

Statistics

Publications

Citations

410

H-Index

Active since

1993

Affiliations

Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology(Current)

Von Ardenne (Germany)

F. Milde is an author at Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology specializing in applied physics, engineering, and magnetism.

Top concepts

EngineeringApplied PhysicsMagnetismMaterial SciencePhysicsPulse PowerPhotovoltaicsPlasma SciencePolymer ScienceMicroelectronics

Publications per year

1993–2009

Publications

Pulsed magnetron sputter technology

S. Schiller, K. Goedicke, J. Reschke et al. · Surface and Coatings Technology · 1993 · 334 citations

Magnetism, Engineering, Applied Physics +4

Ion energy distributions in AZO magnetron sputtering from planar and rotatable magnetrons

Frank Richter, Thomas Welzel, Ronny Kleinhempel et al. · Surface and Coatings Technology · 2009 · 34 citations

Magnetism, Ion Implantation, Ion Energy Distributions +7

Adhesion behavior of PVD coatings on ECR plasma and ion beam treated polymer films

F. Milde, K. Goedicke, Matthias Fahland · Thin Solid Films · 1996 · 31 citations

Materials Science, Engineering, Adhesive Material +8

Large-area production of solar absorbent multilayers by MF-pulsed plasma technology

F. Milde, M. Dimer, Ch Hecht et al. · Vacuum · 2000 · 11 citations

Materials Science, Solar Physics (Heliophysics), Engineering +7

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