Eric M. Panning

First lithographic results from the extreme ultraviolet Engineering Test Stand

Henry N. Chapman, Avijit K. Ray-Chaudhuri, Daniel A. Tichenor et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 37 citations

Engineering, Electrical Engineering, Optics +10

Implementing flare compensation for EUV masks through localized mask CD resizing

Christof G. Krautschik, Manish Chandhok, Guojing Zhang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 27 citations

Engineering, Computer Engineering, Electrical Engineering +10

<title>Initial results from the EUV engineering test stand</title>

Daniel A. Tichenor, Avijit K. Ray-Chaudhuri, Sang Hun Lee et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 21 citations

Natural Sciences, Physics, Digital Imaging +8

Determination of the flare specification and methods to meet the CD control requirements for the 32-nm node using EUVL

Manish Chandhok, Sang H. Lee, Christof G. Krautschik et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 20 citations

Engineering, Electrical Engineering, Digital Imaging +7

One small step: world's first integrated EUVL process line

J. M. Roberts, Terence Bacuita, Robert Bristol et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 18 citations

Engineering, Electrical Engineering, Manufacturing Engineering +10