A.G. Ushakov

Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor

Dougyong Sung, Sangmin Jeong, Young-Min Park et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2008 · 39 citations

Engineering, Plasma-emission Intensity, Plasma Physics +18

Experimental study of spatial nonuniformities in 100MHz capacitively coupled plasma using optical probe

Vladimir Volynets, A.G. Ushakov, Dong Jun Sung et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2008 · 23 citations

Engineering, Plasma Physics, Plasma Emission Intensity +23

Low-Energy Plasma Source for Clean Vacuum Environments: EUV Lithography and Optical Mirrors Cleaning

Jacqueline van Veldhoven, Aneta Stodólna, A. J. Storm et al. · IEEE Transactions on Plasma Science · 2021 · 19 citations

Engineering, Vacuum Plasma Technology, Plasma Physics +20

UWAVS first mirror plasma cleaning technology using 30–60 MHz RF discharges

A.G. Ushakov, Ad Verlaan, Rob Ebeling et al. · Fusion Engineering and Design · 2018 · 17 citations

Electrical Engineering, Engineering, Nonthermal Plasma +5

ITER visible spectroscopy reference system first mirror plasma cleaning in radio-frequency gas discharge – circuit design and plasma effects

A.G. Ushakov, Ad Verlaan, U. Stephan et al. · Fusion Engineering and Design · 2020 · 17 citations

Electrical Engineering, Engineering, Spectroscopy +7