Gianni Pinelli

Ultrathin ferroic HfO2–ZrO2 superlattice gate stack for advanced transistors

Suraj Cheema, Nirmaan Shanker, Li‐Chen Wang et al. · Nature · 2022 · 348 citations · Full text

Engineering, Materials Engineering, Materials Science +12

Reactive ion etching of indium compounds using iodine containing plasmas

D. C. Flanders, L. D. Pressman, Gianni Pinelli · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1990 · 33 citations

Engineering, Electrical Engineering, Materials Science +17

InAlN/GaN-on-Si HEMT with 4.5 W/mm in a 200-mm CMOS-Compatible MMIC Process for 3D Integration

Shireen Warnock, Chang‐Lee Chen, Jeffrey Knechtl et al. · 2020 · 22 citations

Engineering, Electrical Engineering, Microelectronics +16

CMOS Demonstration of Negative Capacitance HfO₂-ZrO₂ Superlattice Gate Stack in a Self-Aligned, Replacement Gate Process

Nirmaan Shanker, Matthew Cook, Suraj Cheema et al. · 2022 International Electron Devices Meeting (IEDM) · 2022 · 10 citations

Engineering, Electrical Engineering, Materials Science +17