Concepedia

Duane Meyer

DM

5

Publications

127

Citations

5

H-Index

1988

Active since

Affiliations

University of Nebraska–Lincoln(Current)

J.A. Woollam Company (United States)

Duane Meyer is an author at University of Nebraska–Lincoln specializing in applied physics, engineering, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial SciencePhysicsThin FilmsSpectroscopySurface ScienceNatural SciencesMaterials EngineeringSemiconductors

Publications per year

1988–2000

5

Publications

5

Radio-frequency plasma chemical vapor deposition growth of diamond

Duane Meyer, Rodney O. Dillon, John A. Woollam · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1989 · 44 citations

Materials Science, Materials Engineering, Chemical Engineering +12

Highly oriented Tl2Ba2Ca2Cu3O10 thin films by pulsed laser evaporation

S. H. Liou, K. D. Aylesworth, N. J. Ianno et al. · Applied Physics Letters · 1989 · 36 citations

Superconducting Material, Pulsed Laser Evaporation, Engineering +16

Growth of diamond by rf plasma-assisted chemical vapor deposition

Duane Meyer, N. J. Ianno, John A. Woollam et al. · Journal of materials research/Pratt's guide to venture capital sources · 1988 · 22 citations

Materials Science, Materials Engineering, Diamond-like Carbon +4

Variable angle spectroscopic ellipsometry in the vacuum ultraviolet

John A. Woollam, James N. Hilfiker, Thomas E. Tiwald et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2000 · 15 citations

Materials Science, Short Wavelength Optic, Optical Materials +15

Real-Time Analysis Of In-Situ Spectroscopic Ellipsometric Data During Mbe Growth Of III-V Semiconductors

Blaine Johs, J. L. Edwards, K. Shiralagi et al. · MRS Proceedings · 1991 · 10 citations

Semiconductors, Ii-vi Semiconductor, Engineering +11

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