Concepedia

L. Azarnouche

LA

Statistics

Publications

8

Citations

220

H-Index

8

Active since

2009

Affiliations

Centre National de la Recherche Scientifique(Current)

STMicroelectronics (France)

Laboratoire d'Électronique des Technologies de l'Information

Commissariat à l'Énergie Atomique et aux Énergies Alternatives

CEA Grenoble

L. Azarnouche is an author at Centre National de la Recherche Scientifique specializing in materials science, natural sciences, and surface science.

Publications per year

2009–2019

8

Publications

8

Unbiased line width roughness measurements with critical dimension scanning electron microscopy and critical dimension atomic force microscopy

L. Azarnouche, E. Pargon, K. Menguelti et al. · Journal of Applied Physics · 2012 · 50 citations

, , +17

Plasma impact on 193 nm photoresist linewidth roughness: Role of plasma vacuum ultraviolet light

E. Pargon, M. Martin, K. Menguelti et al. · Applied Physics Letters · 2009 · 42 citations

, , +17

Benefits of plasma treatments on critical dimension control and line width roughness transfer during gate patterning

L. Azarnouche, E. Pargon, K. Menguelti et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2012 · 33 citations

, , +17

HBr Plasma Treatment Versus VUV Light Treatment to Improve 193 nm Photoresist Pattern Linewidth Roughness

E. Pargon, L. Azarnouche, Marc Fouchier et al. · Plasma Processes and Polymers · 2011 · 29 citations

, , +13

Vacuum ultra violet absorption spectroscopy of 193 nm photoresists

Marc Fouchier, E. Pargon, L. Azarnouche et al. · Applied Physics A · 2011 · 20 citations

, , +12

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