Dain Sung

Investigation of SiO2 Etch Characteristics by C6F6/Ar/O2 Plasmas Generated Using Inductively Coupled Plasma and Capacitively Coupled Plasma

Dain Sung, Long Wen, Hyunwoo Tak et al. · Materials · 2022 · 34 citations · Full text

Effect of hydrofluorocarbon structure of C3H2F6 isomers on high aspect ratio etching of silicon oxide

Hyun Woo Tak, Hye Joo Lee, Long Wen et al. · Applied Surface Science · 2022 · 30 citations

Materials Engineering, Materials Science, Engineering +10

Characteristics of high aspect ratio SiO2 etching using C4H2F6 isomers

Hye Joo Lee, Hyun Woo Tak, Seong Bae Kim et al. · Applied Surface Science · 2023 · 23 citations

Materials Science, Materials Engineering, Wafer Scale Processing +10

Study on plasma characteristics and gas analysis before and after recovery using liquid-fluorocarbon precursor

Jun‐Young Park, Byoungmoon Oh, Kyongnam Kim et al. · Applied Surface Science · 2020 · 10 citations