Statistics
Publications
5
Citations
73
H-Index
5
Active since
1984
Affiliations
Yusuke Takeuchi is an author at Nitto (Japan) specializing in engineering, electronic packaging, and applied physics.
Publications per year
1984–2002
5
5
A new deep reactive ion etching process by dual sidewall protection layer
Junji Ohara, Kazuhiko Kano, Yusuke Takeuchi et al. · 2002 · 15 citations
Improvement of Si/SiO/sub 2/ mask etching selectivity in the new D-RIE process
Junji Ohara, Kazuhiko Kano, Yusuke Takeuchi et al. · 2002 · 10 citations
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